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JoMM“Special Issue on CAD Technologies”特刊發表

稿件來源: 發布時間:2021-01-21

  近期,《Journal of Microelectronic Manufacturing》(JoMMISSN2578-3769)邀請李序武博士(Dr. Shiuh-Wuu Leeex-EVP and ex-CTO of SMIC)為本期專欄的客座編輯,出版了主題為“CAD Technologies”的特刊專欄。特刊文章的作者來自IntelUC BerkeleyTU BraunschweigU. of GlasgowSynopsysICRDAnchor SemiconductorIMECAS等國際著名集成電路企業、大學和研究機構。 

  JoMM旨在發表集成電路制造領域中從基礎研究階段到工業大規模量產階段的研究成果,目前已被CrossrefDOAJCAS、知網、維普等數據庫收錄。JoMM的發表內容包括但不限于DesignProcessMetrology & Yield ControlPackagingMaterialsEquipment 等方面。  

       本期特刊文章如下: 

      Guest Editorial: Special Issue on CAD Technologies 

      Shiuh-Wuu Lee 

      2020 JoMM Volume 3, Issue 4: 20030401 


 

      BSIM-CMG compact model for IC CAD: from FinFET to Gate-All-Around FET Technology 

  Avirup Dasgupta, Chenming Hu. 

  2020 JoMM Volume 3, Issue 4: 20030402 

   On the History of the Numerical Methods Solving the Drift Diffusion Model 

  Bernd Meinerzhagen. 

  2020 JoMM Volume 3, Issue 4: 20030403 

  

  Nano-Electronic Simulation Software (NESS): A Novel Open-Source TCAD Simulation Environment 

  Cristina Medina-Bailon, Tapas Dutta, Fikru Adamu-Lema, Ali Rezaei, Daniel Nagy, Vihar P. Georgiev, Asen Asenov. 

  2020 JoMM Volume 3, Issue 4: 20030404 
 

 

  First-principles Simulations of Tunneling FETs Based on van der Waals MoTe2/SnS2 Heterojunctions with Gate-to-drain Overlap Design 

  Kun Luo, Kui Gong, Jiangchai Chen, Shengli Zhang, Yongliang Li, Huaxiang Yin, Zhenhua Wu. 

  2020 JoMM Volume 3, Issue 4: 20030405 

 

 

  Material Modeling in Semiconductor Process Applications 

  Boris A. VoinovPatrick H. KeysStephen M. CeaAnanth P. KaushikMark A. Stettler. 

  2020 JoMM Volume 3, Issue 4: 20030406 

 

 

  Fast and Accurate Machine Learning Inverse Lithography Using Physics Based Feature Maps and Specially Designed DCNN 

  Xuelong ShiYan YanTao ZhouXueru YuChen LiShoumian ChenYuhang Zhao. 

  2020 JoMM Volume 3, Issue 4: 20030407 

   Machine Learning based Optical Proximity Correction Techniques 

  Pengpeng Yuan, Taian Fan, Yaobin Feng, Peng Xu, Yayi Wei. 

  2020 JoMM Volume 3, Issue 4: 20030408  

 

  Enabling Variability-Aware Design-Technology Co-Optimization for Advanced Memory Technologies 

  Salvatore M. AmorosoPlamen AsenovJaehyun LeeNara KimKo-Hsin LeeYaohua TanYong-Seog OhLee SmithXi-Wei LinVictor Moroz. 

  2020 JoMM Volume 3, Issue 4: 20030409 
 

 

  Pattern-Centric Computational System for Logic and Memory Manufacturing and Process Technology Development 

  Chenmin HuKhurram ZafarAbhishek VikramGeoffrey Ying. 

  2020 JoMM Volume 3, Issue 4: 20030410 


   作為開放閱覽電子學術期刊,JoMM致力于實現快速發表,稿件錄用后即時上線,可閱覽、下載、引用。目前JoMM正在進行2021年征稿,并免版面費,同時也在征集Special Issue的專題(topic is open),以及歡迎新編委、同行評審專家加入JoMM,詳情請查看官網www.jommpublish.org/. 

       歡迎投稿! 

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